The difference between pecvd & cvd
CVD (chemical vapor deposition), refers to the composition and reaction film containing vapor elements of gaseous reactants or liquid reactants required other gas into the reaction chamber, in the process of chemical reaction occurs at the surface of the thin film substrate
Plasma Enhanced Chemical Vapor Deposition,
PECVD, is a type of Chemical Vapor Deposition, CVD, in which the chemical reaction is induced by RF power energy either with capacitive coupling or inductive coupling electrodes. There are many variations of PECVD systems with heated substrates, and varying pressure ranges. The RF frequency normally employed in PECVD is 13.56 MHz
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