The slide PECVD high-temperature furnace, also known as the sliding plasma enhanced chemical vapor deposition (PECVD) high-temperature furnace, is a heat treatment equipment that combines a sliding tube furnace heating system with PECVD technology. Let's take a detailed look at the device introduction below!

Commonly used slide PECVD high-temperature furnace (click on the image to view product details)

1. Equipment composition
The slide PECVD high-temperature furnace mainly consists of the following key components:
1200 degree sliding tube furnace heating system: This is the core heating part of the equipment, which can provide a high temperature environment of up to 1200 ℃ to ensure the smooth progress of chemical reactions. The sliding design allows the furnace body to move along the bottom track, facilitating rapid cooling and sample processing.
Vacuum system: used to maintain a low-pressure environment inside the furnace and is an important part of PECVD technology. Low pressure environment helps to reduce the collision frequency of gas molecules, improve the activity of plasma, and promote chemical reactions.
Quality flow meter gas supply system: controls the flow rate and proportion of reaction gases to ensure the accuracy and stability of chemical reactions.
Plasma RF power supply: generates an RF electric field to excite reactive gases and form plasma. High activity particles in plasma can accelerate chemical reactions, improve the deposition rate and quality of thin films.

2. Working principle
The working principle of the slide PECVD high-temperature furnace is mainly based on PECVD technology. Under low pressure conditions, the reaction gas is excited by a radio frequency power source to form plasma. Highly active particles (such as electrons, ions, and active groups) in plasma undergo chemical reactions on the surface of the substrate, depositing the desired thin film. This technology has the advantages of fast deposition rate, high film quality, and good controllability of process parameters.

3. Application Fields
The slide PECVD high-temperature furnace is widely used in multiple fields, including but not limited to:
Semiconductor industry: used for manufacturing high-quality thin films in integrated circuits, such as dielectric layers such as silicon dioxide and silicon nitride.
Solar cell manufacturing: uniformly depositing thin films on wide surface areas such as solar panels or optical glass to improve the photoelectric conversion efficiency of solar cells.
Optical coating: producing coatings with specific optical properties, such as anti reflective coatings and anti reflective coatings.
Preparation of nano thin films: Prepare nano thin films with uniform thickness, high temperature resistance, wear resistance, and high purity to meet the needs of consumer electronics and other fields.
Medical implants: Improve the biocompatibility and corrosion resistance of medical implants through surface modification.
Wear resistant coating: Deposition of wear-resistant coatings such as diamond-like carbon to improve the wear resistance and low friction of materials.

4. Advantages and Characteristics
High temperature environment: Provides a heating environment of up to 1200 ℃ to meet the needs of high-temperature chemical reactions.
Sliding design: facilitates rapid cooling and sample processing, improving production efficiency.
Precise control: By using a mass flow meter and an RF power supply, the reaction conditions are precisely controlled to ensure the deposition quality and stability of the thin film.
Widely applicable: Suitable for high-quality film preparation needs in multiple fields.

1200 ℃ slide PECVD high-temperature furnace (click on the picture to view product details)

So, the slide PECVD high-temperature furnace is a powerful and widely used heat treatment equipment, which plays an important role in fields such as semiconductors, solar cells, and optical coatings.Click to learn more PECVD devices! Or click on online customer service to learn more about product information!