The tubular PECVD (plasma enhanced chemical vapor deposition) experimental electric furnace has various characteristics. Let's take a detailed look below!

Commonly used tubular PECVD experimental furnace (click on the image to view product details)

1. Efficient sedimentation performance
Gas preheating: The tubular PECVD experimental furnace is usually equipped with a front-end gas preheating zone, which makes the deposition rate faster and the film formation effect better. Preheating the gas helps to increase the reaction rate, thereby shortening the production cycle.
High thin film deposition rate: Through radio frequency glow technology, the tubular PECVD electric furnace can greatly improve the deposition rate of thin films, which further shortens production time and improves production efficiency.

2. Good film-forming quality
High surface uniformity: By using excellent multi-point radio frequency technology, special gas path distribution, and heating technology, the tubular PECVD experimental furnace can ensure a high level of film uniformity, thereby ensuring consistent product quality.
High concentration and high precision: In semiconductor and other applications, this device can achieve small deviations between deposited substrates, ensuring high concentration and high precision of the product.
Good adhesion: Due to the high-energy plasma generated by the plasma generator, the adhesion between the generated film and the sample surface is stronger, thereby improving the durability and reliability of the product.

3. Convenient control system
Control system: heating control, plasma RF control, gas flow control, vacuum system control and other functions are usually concentrated on one touch screen or key for unified centralized adjustment and control. This coordinated control mode makes operation easier and more powerful.
Automatic pressure balancing inside the tube: The equipment can monitor the pressure inside the tube in real time and automatically balance it to ensure the stability of the experimental process.
Intelligent gas circuit on/off: Each gas circuit can be timed on/off, which not only saves time and effort, but also helps improve the accuracy and safety of experiments.
RF power and switch timing control: Users can pre-set the power level and the time for opening and closing, and the device will automatically operate according to the settings.

4. Flexible experimental setup
The furnace can be customized to rotate and tilt: According to experimental requirements, users can set the furnace rotation speed or tilt angle, which makes the experimental process more flexible.
Multifunctionality: The tubular PECVD experimental furnace can be used not only for growing various thin films (such as metal films, ceramic films, composite films, etc.), but also for vacuum coating, preparation of nano thin film materials, and expansion of plasma cleaning and etching functions.

5. High level of safety and reliability
Structural design: The entire machine structure is integrated, making it easy to move and avoiding the trouble of scattered assembly, while also helping to improve the safety of the equipment.
Security protection: The equipment is designed with full consideration for safety and reliability, such as real-time monitoring of pipe pressure, intelligent gas circuit on/off, and RF power and switch timing control, to ensure the safety and stability of the equipment during operation.

Tube type PECVD experimental furnace with rotation and tilt function (click on the picture to view product details)

Overall, the tubular PECVD experimental furnace has the characteristics of efficient deposition performance, good film quality, convenient control system, flexible experimental setup, and high safety and reliability. These characteristics make the device have broad application prospects in multiple fields.Click to learn more PECVD devices! Or click on online customer service to learn more about product information!