PECVD (Plasma Enhanced Chemical Vapor Deposition) has a wide range of applications in the semiconductor field, mainly reflected in the following aspects:

Commonly used rotating tilted PECVD tube furnace (click on the image to view product details)

1. Key Technologies for Manufacturing Integrated Circuits
Deposition of high-quality thin films: PECVD technology is one of the main techniques for manufacturing integrated circuits in the semiconductor industry. It can deposit high-quality thin films such as silicon dioxide (SiO ₂) and silicon nitride (Si ∝ N ₄) on the substrate surface by controlling specific process parameters. These films are used to isolate multiple conductive layers and capacitors, and are an important part of integrated circuit manufacturing.
Improving process efficiency: Compared with traditional chemical vapor deposition (CVD), PECVD can deposit at lower temperatures, reducing energy consumption, protecting temperature sensitive substrates, and providing better control accuracy and product quality.

2. Optimize the performance of solar cells
Deposition of anti reflective thin films: PECVD is a deposition technology for manufacturing solar cells and photovoltaic modules. It can uniformly deposit thin films, such as silicon nitride (SiNx) anti reflective films, on wide surface areas such as solar panels or optical glass. This type of film can fully absorb sunlight, reduce reflection, and protect solar cells from contamination through its passivation effect, thereby improving the photoelectric conversion efficiency of solar cells.
Optimizing battery performance: The silicon nitride film generated by PECVD technology contains a large amount of hydrogen, which can effectively passivate dislocations and surface dangling bonds in silicon, improve the mobility of charge carriers in silicon wafers, and thus enhance the overall performance of solar cells.

3. Produce coatings with specific optical properties
PECVD technology is also widely used in the production of coatings with specific optical properties, such as anti reflective coatings, anti reflective coatings, etc. These coatings can be used for optical products such as sunglasses, colored optical devices, and photometers to improve the optical performance and service life of the products. In the semiconductor industry, these coatings may be used to protect or enhance the optical properties of semiconductor components.

4. Provide high-performance nanofilms
Protecting internal circuit boards: PECVD polymer nanofilms have advantages such as uniform film thickness, high temperature resistance, wear resistance, and high purity. In the semiconductor industry, these nanofilms can be used to produce internal circuit boards and other components, providing protective functions such as corrosion and moisture resistance, and improving product stability and reliability.
Protecting key components: PECVD polymerized nano films have electronic protection properties and can be used for the protection of semiconductor devices. For example, in the central control system, boost charging system, and BMS system of new energy vehicles, PECVD nanofilm can improve the stability and safety of the system.

Large diameter PECVD electric furnace (click on the image to view product details)

Overall, the application of PECVD technology in the semiconductor field covers multiple aspects such as integrated circuit manufacturing, solar cell performance optimization, production of specific optical performance coatings, and provision of high-performance nanofilms. These applications not only improve the performance and reliability of semiconductor products, but also contribute to the continuous progress and development of semiconductor technology.Click to learn more PECVD devices! Or click on online customer service to learn more about product information!