Multi gas path PECVD (plasma enhanced chemical vapor deposition) electric furnace is a commonly used thin film deposition equipment, widely used in fields such as microelectronics, optoelectronics, flat panel displays, energy storage, and photovoltaic manufacturing. Let's take a look at how multi gas path PECVD electric furnace works!

Commonly used multi gas path PECVD electric furnace (click on the image to view product details)

1. Technical principles and characteristics
Technical principle:
The multi gas path PECVD electric furnace utilizes plasma enhanced chemical vapor deposition technology to induce glow discharge on the cathode (sample tray) of the process chamber through low-temperature plasma in a low-pressure environment.
By utilizing a radio frequency electric field, a gas containing atoms composed of a thin film is localized to form a plasma, which then deposits a solid thin film on the surface of the sample.
Main features:
Low temperature deposition: capable of efficiently depositing thin films in low-temperature environments, suitable for applications that require high thermal stability of substrate materials.
High purity thin film: By finely controlling the composition and process parameters of the reaction gas, a thin film with good uniformity and high purity can be generated.
Multi material deposition capability: capable of depositing various materials such as SiO2, Si3N4, Al2O3, etc., expanding the application range.
Surface modification: Using plasma to achieve changes in the hydrophilicity, hydrophobicity, and other properties of the material surface.

2. Performance advantages
Fast sedimentation rate: The effective sedimentation rate improves experimental efficiency and material utilization, reducing production costs.
Good film uniformity: The equipment adopts advanced gas flow design and temperature control system to ensure that the film forms a highly consistent thickness and composition on the substrate, improving product quality and process stability.
Intelligent operation: The centralized control system and intelligent functions simplify experimental operations and improve work efficiency. For example, functions such as intelligent gas circuit on/off, RF power, and switch timing control make device operation more convenient.
Strong material compatibility: capable of depositing various types of materials to meet the needs of different research fields.
Environmental performance: The low-temperature deposition process reduces energy consumption and emissions of harmful substances, meeting environmental requirements.

3. Application Fields
Microelectronics field: thin film materials used for the preparation of transistors, integrated circuits, and other devices.
Optoelectronic field: used for the preparation of thin film materials such as photoelectric sensors and optoelectronic devices.
Flat panel display field: used to prepare thin film materials for devices such as tablets and displays.
Energy storage field: used to prepare thin film materials for energy storage devices such as lithium-ion batteries and solar cells.
Photovoltaic manufacturing: plays a significant role in the preparation process of solar panels, such as depositing SiNx anti reflective films to enhance photoelectric conversion efficiency and protect the cells.

4. Equipment selection and precautions
Equipment selection: Choose appropriate equipment models and configurations based on factors such as the laboratory's spatial layout, actual needs, and budget.
Operation and maintenance: Equipment operators should be familiar with the instructions and operating procedures of the equipment, and regularly carry out maintenance and upkeep work on the equipment.
Safety protection: The equipment should have safety protection functions such as over temperature protection and leakage protection to ensure the safety of experimental personnel.

Customized multi gas path PECVD electric furnace with preheating (click on the image to view product details)

Overall, multi gas path PECVD electric furnaces have the characteristics and advantages of low-temperature deposition, high-purity thin films, multi material deposition capability, surface modification, and intelligent operation. They have broad application prospects in fields such as microelectronics, optoelectronics, flat panel displays, energy storage, and photovoltaic manufacturing. When selecting and using equipment, factors such as laboratory conditions, actual needs, and safety protection should be fully considered.Click to learn more PECVD devices! Or click on online customer service to learn more about product information!