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NEWS
PECVD (Plasma Enhanced Chemical Vapor Deposition) experimental furnace is a commonly used material preparation equipment with a wide range of applications. Customized PECVD experimental furnaces can be used to burn or process various materials. Let's take a detailed look below!
Commonly used multi gas path PECVD electric furnace (click on the image to view product details)
Thin film growth:
Metal thin films: The growth of metal thin films such as copper, aluminum, titanium, etc., which have important applications in fields such as electronics, optics, and sensors.
Ceramic thin films: The growth of ceramic thin films such as alumina and silicon nitride, which have good wear resistance, corrosion resistance, and high temperature stability.
Composite film: A composite film composed of multiple materials, such as metal ceramic composite films, with special physical and chemical properties.
Semiconductor materials:
In the semiconductor industry, PECVD is commonly used to manufacture dielectric layers, low-k dielectric materials, and silicon-based optoelectronic devices in integrated circuits. For example, in CMOS (Complementary Metal Oxide Semiconductor) devices, PECVD is commonly used for the fabrication of gate oxide layers and field oxide layers.
PECVD technology can accurately control process parameters and deposit high-quality thin films on the substrate surface, such as silicon dioxide and silicon nitride dielectrics, for isolating multiple conductive layers and capacitors.
Solar cell:
PECVD is one of the main deposition technologies for manufacturing solar cells and photovoltaic modules. It can uniformly deposit thin films on wide surface areas such as solar panels or optical glass. By adjusting the plasma parameters, the refractive quality of the optical coating can be finely controlled, thereby improving the photoelectric conversion efficiency of solar cells.
Other applications:
The PECVD experimental electric furnace can also be used for vacuum coating, preparation of nano thin film materials, and expansion of plasma cleaning and etching functions.
PECVD experimental furnaces are widely used in industries such as rare earth preparation, electronic lighting, crystal annealing, bioceramics, electronic ceramics, special alloys, magnetic materials, precision casting, and metal heat treatment.
In addition, the specific application of customized PECVD experimental furnaces also depends on their design and configuration. For example, furnace materials, heating elements, atmosphere control systems, and vacuum systems can all affect their experimental effectiveness and applicability. Therefore, when selecting and customizing PECVD experimental furnaces, comprehensive consideration should be given based on specific research or production needs.
Rotating tilt customized PECVD experimental furnace (click on the image to view product details)
Overall, customized PECVD experimental furnaces have broad application prospects and flexibility, and can meet the needs of different fields and specific materials.Click to learn more PECVD devices! Or click on online customer service to learn more about product information!
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