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NEWS
The process of PECVD (Plasma Enhanced Chemical Vapor Deposition) electric furnace coating is a complex and sophisticated technique, mainly involving chemical reaction processes assisted by low-temperature plasma. So how is the PECVD electric furnace coated in detail? Let's take a look below!
Commonly used PECVD electric furnaces (click on the image to view product details)
1. Preparation before coating
Cleaning and pretreatment: Clean and pretreat the surface of the coating to remove impurities such as grease and oxides, and create a good surface condition for subsequent coating treatment.
Establishment of vacuum environment: Load the object to be plated into a vacuum chamber, and use equipment such as a vacuum pump to reduce the pressure inside the chamber to a certain level, in order to provide a clean and impurity free coating environment.
2. Coating process
Gas introduction and plasma excitation:
Gas introduction: Introduce an appropriate amount of process gas into the vacuum chamber, which is usually used as a precursor for forming the desired thin film, such as silane (SiH4), nitrous oxide (N2O), nitrogen gas (N2), etc.
Plasma excitation: Under the action of an electric field excited by a radio frequency source, the reaction gas ionizes and forms plasma. Electrons, ions, and reactive groups in plasma have high energy and reactivity, which can initiate and accelerate chemical reactions.
Chemical reactions and thin film growth:
Primary reaction: Under the action of plasma, the reaction gas decomposes, forming a mixture of ions and active groups.
Secondary reactions: Various active groups diffuse and transport towards the surface and tube wall of the thin film growth, while secondary reactions occur between the reactants.
Thin film growth: Various primary and secondary reaction products that reach the growth surface are adsorbed and react with the surface to generate solid film nuclei. The crystal nucleus gradually grows into island like structures, which continue to grow into continuous thin films. During the process of film growth, various by-products gradually detach from the surface of the film and are discharged from the outlet under the action of a vacuum pump.
Parameter control:
Temperature control: The temperature inside the chamber is controlled by a heating system, usually between 300-500 ° C, to ensure the smooth progress of chemical reactions and the stability of film quality.
Gas flow control: Accurately control the flow rate of the reaction gas to ensure the uniformity and quality of the film.
RF power control: The magnitude of RF power affects the energy and reaction rate of plasma, thereby affecting the growth rate and quality of thin films.
3. Post coating treatment
After the coating is completed, it is usually necessary to perform post-treatment on the coating, such as annealing, cleaning, etc., to further improve the performance and stability of the film.
Customized Rotating PECVD Electric Furnace (Click on the image to view product details)
4. Summary
The PECVD electric furnace coating process is a complex process that integrates chemical reactions, physical processes, and plasma technology. By precisely controlling various parameters and process conditions, high-quality, uniformly dense thin film materials can be prepared. This coating technology has broad application prospects in fields such as semiconductors, optoelectronics, and solar cells.Click to learn more PECVD devices! Or click on online customer service to learn more about product information!
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